Ultrasonic cleaning is recognized as the most efficient and effective cleaning method at present. Its cleaning efficiency has reached more than 98%, and the cleaning cleanliness has also reached the highest level. Therefore, all industries that require high cleanliness choose ultrasonic cleaning. After years of development of ultrasonic cleaning technology, we can look forward to its development direction from two aspects: one is the development direction of ultrasonic cleaning equipment; the other is the future development trend of ultrasonic power.
(1) The development direction of ultrasonic cleaning equipment
①Efficient and economical cleaning equipment is needed.
With the expansion of the application range of ultrasonic cleaning equipment, ultrasonic cleaning equipment urgently needs to be updated in the face of new technology. In response to the emergence of new technologies, new materials, and new products, the designed special ultrasonic cleaning equipment should have: excellent cost performance, efficient combination with other cleaning methods, and a certain degree of automation.
②Ultrasonic hydrocarbon vacuum cleaning equipment needs to develop.
Environmental protection is a basic national policy in China. The ODS organic solvents used in the cleaning industry before are banned. Therefore, it is necessary to develop new cleaning equipment that uses non-ODS solvents. Economical and environmentally friendly hydrocarbon solvent ultrasonic cleaning equipment highlights its superior performance. The low flash point of hydrocarbon solvents limits its application in ultrasonic cleaning. After the introduction of ultrasonic hydrocarbon vacuum cleaning technology, not only has the purpose of safety and environmental protection been achieved, but the ultrasonic hydrocarbon cleaning under vacuum also strengthens the cleaning function. Vigorously developing hydrocarbon vacuum cleaning has become the development direction of environmentally friendly ultrasonic cleaning in the future.
③High-frequency ultrasonic cleaning equipment needs to develop.
At present, low and medium frequency ultrasonic cleaning machines are widely used in the industry, that is, the 20~50 kHz frequency band, and there is an urgent need to develop 50~200 kHz high frequency and megahertz ultrasonic cleaning equipment.
Megahertz ultrasonic cleaning technology has the following main advantages: one is to avoid damage to the surface of the device when cleaning; the other is to more accurately remove the submicron dirt attached to the surface of the device.
Megahertz ultrasonic cleaning equipment already exists in the market, and the products mainly come from abroad. The megahertz ultrasonic cleaning equipment developed in my country has not yet gone from the laboratory to the engineering application. Megahertz ultrasonic cleaning equipment is mainly used in semiconductor production lines for the cleaning of 100-300mm silicon wafers. It can remove 0.15μm particles on the surface of the silicon wafer and prevent the particles from reattaching during the rinsing process. It can be seen that megahertz ultrasonic cleaning equipment is already indispensable in the manufacturing process of large-scale integrated circuits.
④Special applications for ultrasonic cleaning need to develop.
Ultrasonic cleaning is usually the cleaning of parts. With the continuous improvement of the process, some special applications have appeared, such as ultrasonic anti-fouling online cleaning. Ultrasonic anti-fouling cleaning mainly uses ultrasonic strong sound field to treat fluids, so that the physical form and chemical properties of the fouling substances in the fluid under the action of the ultrasonic field undergo a series of changes, so that they are dispersed, crushed, loosened, loosened and difficult to adhere. The tube and vessel wall form fouling. Ultrasonic strong sound field treatment fluid not only has the effect of anti-scaling, but also can accelerate the heat transfer rate of the liquid surface and improve the heat transfer efficiency of the liquid. The emergence of these new applications has given greater play to the function of ultrasonic cleaning and opened up new areas of ultrasonic applications.
(2) The future development trend of ultrasonic power
With the development of semiconductor technology, new power electronic devices will continue to appear, and new control theories are proposed. The development trend of ultrasonic power supplies mainly includes the following aspects:
①High power factor, low harmonic pollution
With the promulgation and mandatory implementation of the IEC61000-3-2 standard, power factor correction is introduced to improve the input power factor of the system, reduce the harmonic components of the input current, improve the current waveform on the grid side, and improve the efficiency of the grid, becoming the current power electronics The development trend of technology application.
②Large-capacity, generalization
The large-capacity ultrasonic power supply is still one of the current research goals, and, in order to meet the needs of various industries, the generalization of the ultrasonic power supply has become a new development requirement.
③Miniaturization, low cost
For the purpose of saving raw materials, reducing costs, and improving cost performance, the miniaturization and low cost of ultrasonic power supplies are also a development direction.
④Sweep frequency, frequency hopping multi-function
The purpose of the multifunctionalization of the generator is to effectively match the piezoelectric transducer. Frequency sweeping and frequency hopping cleaning are both to improve the sound field structure in the tank. The former solves the uneven standing wave field in the tank and makes the cleaning uniform. The latter is the same as multi-frequency, taking into account high and low frequency cleaning. The difference is that frequency hopping uses a transducer and a generator. The transducer itself has two resonant frequencies. It makes continuous frequency changes within the bandwidth of the first resonance point, and then jumps to another bandwidth. Sweep frequency cleaning, high and low frequency alternate cleaning, the purpose is to overcome the uneven cleaning problem caused by the single frequency cleaning standing wave field.
⑤Intelligent and integrated
With the development of industrial products towards miniaturization, intelligence, long life, and high reliability, in the great changes of "Internet Ten Manufacturing", ultrasonic cleaning technology has also advanced with the times. In many aspects of industrial production and social life, There is an active stage for it. Various new processors are gradually applied to the ultrasonic power supply, so that the entire ultrasonic system has excellent stability and reliability, and can integrate multiple functions, such as automatic frequency tracking, fault online detection, remote control, centralized control of networking, etc. Therefore, intelligence and integration are also one of the development trends of new ultrasonic power supplies.
Ultrasonic cleaning is an emerging multi-disciplinary application technology. Under the background of the rapid development of industrial science and technology, there is a huge market demand. Some colleges and universities and research institutions in my country have also begun to invest in research in theory and application. Industry associations and The exchanges between international counterparts are constantly increasing. It is foreseeable that ultrasonic cleaning will be accompanied by the vigorous development of the low-carbon economy and extend to a broader field of emerging industries.